glow discharge processes sputtering and plasma etching pdf

Glow Discharge Processes Sputtering And Plasma Etching Pdf

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Glow discharge processes. Sputtering and plasma etching

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Glow discharge processes. Sputtering and plasma etching

The aim of this paper is to obtain an extensive experimental characterization of a DC magnetron sputtering device used for plasma processing of materials. Models and measurements are combined for an interdisciplinary characterization of a DC magnetron sputtering device. Data on magnetic and electric fields, electron temperature and density, plasma potential and target erosion are provided. An estimation of the target heating is proposed. Finally, an application concerning thin film deposition is reported.

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Enter your mobile number or email address below and we'll send you a link to download the free Kindle App. Then you can start reading Kindle books on your smartphone, tablet, or computer - no Kindle device required. To get the free app, enter your mobile phone number. Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge.

Skip to Main Content. A not-for-profit organization, IEEE is the world's largest technical professional organization dedicated to advancing technology for the benefit of humanity. Use of this web site signifies your agreement to the terms and conditions. Glow discharge processes; Sputtering and plasma etching. Article :.

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Hollow cathode discharge: application of a deposition treatment in the iron sintering. I brunatto ufpr. The influence of a previous deposition treatment on the final amount of alloying elements Cr and Ni deposited and diffused into the surface of iron parts sintered in hollow cathode discharge HCD was studied. Cylindrical pure iron pressed samples, being a central cathode, were placed concentrically in the interior of an AISI steel machine-made outer cathode, resulting in a 6 mm inter-cathode radial spacing.

Characterization of a DC magnetron sputtering device

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Diamond and Diamond-like Films and Coatings pp Cite as. Low pressure glow discharge plasmas are today frequently used in materials processing. For example, sputter deposition and other ion assisted growth techniques are essential for production of semiconductor devices, hard wear resistant coatings and for various optical thin films.

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4 Comments

  1. RenГ©e L.

    Plasma etching is a form of plasma processing used to fabricate integrated circuits.

    25.04.2021 at 07:45 Reply
  2. Amelie J.

    Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge.

    27.04.2021 at 19:20 Reply
  3. Sqea

    Glow discharge processes. Sputtering and plasma etching. admin | January 30, | Mathematics Categories: Physics Plasma Physics. Year: Publisher.

    29.04.2021 at 14:50 Reply
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